Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO₂ substrates

• Aleksandra Szkudlarek,
• Jan M. Michalik,
• Inés Serrano-Esparza,
• Zdeněk Nováček,
• Veronika Novotná,
• Piotr Ozga,
• Czesław Kapusta and
• José María De Teresa

Beilstein J. Nanotechnol. 2024, 15, 190–198, doi:10.3762/bjnano.15.18

• the dissociated products of residual water molecules was not provided. An emission of charged Si and O ions from the SiO2 surface upon electron exposure was studied in the 1990s. This phenomenon, known as electron-stimulated desorption (ESD) was observed in UHV conditions by Baragiola et al. [25] and

Irradiation-driven molecular dynamics simulation of the FEBID process for Pt(PF₃)₄

• Alexey Prosvetov,
• Alexey V. Verkhovtsev,
• Gennady Sushko and
• Andrey V. Solov’yov

Beilstein J. Nanotechnol. 2021, 12, 1151–1172, doi:10.3762/bjnano.12.86

• , during, and after irradiation, without necessarily explicitly simulating all the involved processes. The present methodology allows for the inclusion of additional processes, such as electron-stimulated desorption and chemical reaction between fragments, deposits, and the substrate. Investigating the

Electron-driven and thermal chemistry during water-assisted purification of platinum nanomaterials generated by electron beam induced deposition

• Ziyan Warneke,
• Markus Rohdenburg,
• Jonas Warneke,
• Janina Kopyra and
• Petra Swiderek

Beilstein J. Nanotechnol. 2018, 9, 77–90, doi:10.3762/bjnano.9.10

• (methylcyclopentadienyl)platinum(IV) (MeCpPtMe3). The experiments performed under ultrahigh vacuum conditions apply a combination of different desorption experiments coupled with mass spectrometry to analyse reaction products. Electron-stimulated desorption monitors species that leave the surface during electron exposure

• -induced degradation of multilayer condensed films of MeCpPtMe3 Electron-stimulated desorption was first measured from multilayer condensed films of MeCpPtMe3 without added H2O as reference for subsequent experiments (Figure 3). In accord with previous results [10], material is removed from the layer

• precursor degradation. A comparison of MS intensities obtained during electron-stimulated desorption (ESD) and in a post-irradiation thermal desorption spectrometric (TDS) experiment allows us to estimate that more CH4 is released upon temperature increase than during irradiation of the precursor at liquid

Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID)

• Leo Sala,
• Iwona B. Szymańska,
• Céline Dablemont,
• Anne Lafosse and
• Lionel Amiaud

Beilstein J. Nanotechnol. 2018, 9, 57–65, doi:10.3762/bjnano.9.8

• electrons of energy as low as 1.5 eV. Finally, the cross section for this process is estimated from the temporal evolution in the experiments on electron-stimulated desorption (ESD). Conclusion: The release of full ligands under high vacuum and by electron irradiation, and the cross section measured here

• for ligands fragmentation allow one to envisage the use of the two precursors for FEBID studies. Keywords: amines; copper(II); electron-stimulated desorption; FEBID precursors; HREELS; low-energy electrons; perfluorinated carboxylates; Introduction The high electrical conductivity of copper makes it

• used to record spectrum e in Figure 2 was introduced under vacuum for electron-stimulated desorption (ESD) experiments discussed in the next section, but HREELS analysis of these samples was not possible probably due to the combination of native oxide layer and the compound layers on it. Indeed

Comparing postdeposition reactions of electrons and radicals with Pt nanostructures created by focused electron beam induced deposition

• Julie A. Spencer,
• Michael Barclay,
• Miranda J. Gallagher,
• Robert Winkler,
• Ilyas Unlu,
• Yung-Chien Wu,
• Harald Plank,
• Lisa McElwee-White and
• D. Howard Fairbrother

Beilstein J. Nanotechnol. 2017, 8, 2410–2424, doi:10.3762/bjnano.8.240

• PtCl2 structures via an electron-stimulated desorption (ESD) process. It was found that the effectiveness of electrons to purify deposits greater than a few nanometers in height is compromised by the limited escape depth of the chloride ions generated in the purification step. In contrast, chlorine

• present in the deposits, implying efficient electron-stimulated desorption/loss mechanisms during deposition. Similarly, van Dorp et al. [36] recently found that FEBID deposits produced from the Au(III) dimer (ClAuMe2)2 are almost completely free of Cl (2–6 atom %). Studies with AH were motivated by

• region (topmost few nanometers) would ultimately reach a steady state composition when the rate of chlorine diffusion from deeper in the deposit into the near surface region is balanced by the rate of Cl loss due to electron-stimulated desorption. This is consistent with our AES results for thicker PtCl2

Suppression of low-energy dissociative electron attachment in Fe(CO)₅ upon clustering

• Jozef Lengyel,
• Peter Papp,
• Štefan Matejčík,
• Jaroslav Kočišek,
• Michal Fárník and
• Juraj Fedor

Beilstein J. Nanotechnol. 2017, 8, 2200–2207, doi:10.3762/bjnano.8.219

• anion synthesis in pure Fe(CO)5 clusters. As already mentioned, Massey et al. [20] studied degradation of Fe(CO)5 films condensed on a xenon spacer on platinum foil by electron stimulated desorption. They did not observe any anion desorption at electron energies below 4 eV and strong desorption signals

Continuum models of focused electron beam induced processing

• Milos Toth,
• Charlene Lobo,
• Vinzenz Friedli,
• Aleksandra Szkudlarek and
• Ivo Utke

Beilstein J. Nanotechnol. 2015, 6, 1518–1540, doi:10.3762/bjnano.6.157

• the growth rate or the deposit height (etch pit depth) at the beam axis (r = 0). We emphasize that the above equations are valid only in the reaction rate limited growth regime where net transport of adsorbates through diffusion is negligible. We also note that electron-stimulated desorption (ESD) [48

• reactions, and that electron-stimulated desorption of all species is negligible. The most significant consequence of the model defined by Equation 53–Equation 61 is that etching is inhibited at high electron fluxes, as seen in Figure 16a, due to electron-induced dissociation of SiFn. Specifically, this

Formation of pure Cu nanocrystals upon post-growth annealing of Cu–C material obtained from focused electron beam induced deposition: comparison of different methods

• Aleksandra Szkudlarek,
• Alfredo Rodrigues Vaz,
• Yucheng Zhang,
• Andrzej Rudkowski,
• Czesław Kapusta,
• Rolf Erni,
• Stanislav Moshkalev and
• Ivo Utke

Beilstein J. Nanotechnol. 2015, 6, 1508–1517, doi:10.3762/bjnano.6.156

• larger pure copper crystals (up to 150 nm in size). In comparison to the above results the differences may be explained by invoking an electron stimulated desorption effect which was suggested for FEBID by van Dorp et al. [46] which would facilitate the desorption of carbonaceous fragments and thus the

Electron-beam induced deposition and autocatalytic decomposition of Co(CO)₃NO

• Florian Vollnhals,
• Martin Drost,
• Fan Tu,
• Esther Carrasco,
• Andreas Späth,
• Rainer H. Fink,
• Hans-Peter Steinrück and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2014, 5, 1175–1185, doi:10.3762/bjnano.5.129

• subsequently exposed to Co(CO)3NO. The investigated surfaces were SiOx layers on Si(100) and Si3N4, both of which are suitable substrates for EBISA using Fe(CO)5 [7][16]. On these surfaces, electron stimulated desorption of oxygen and the thereby created oxygen vacancies were identified as the active sites for

The role of electron-stimulated desorption in focused electron beam induced deposition

• Willem F. van Dorp,
• Thomas W. Hansen,
• Jakob B. Wagner and
• Jeff T. M. De Hosson

Beilstein J. Nanotechnol. 2013, 4, 474–480, doi:10.3762/bjnano.4.56

• between estimates for Edes from FEBIP experiments compared to literature values is consistent with earlier findings by other authors. The discrepancy is attributed to electron-stimulated desorption, which is known to occur during electron irradiation. The data suggest that, of the W(CO)6 molecules that

• al. have performed the same measurement for WF6 [16] and found a desorption energy that was three to five times lower than expected. Li et al. explained this difference with electron-stimulated desorption. Electron-stimulated desorption is known to occur during electron irradiation, being the result

• pA, in our experiments the estimated beam currents are between 1 and 6 pA. The results demonstrate that indeed electron-stimulated desorption plays a significant role in FEBIP. The FEBIP value for Edes is three times lower than the TPD value, which we assume is more realistic. In order to find a

Focused electron beam induced deposition: A perspective

• Michael Huth,
• Fabrizio Porrati,
• Christian Schwalb,
• Marcel Winhold,
• Roland Sachser,
• Maja Dukic,
• Jonathan Adams and
• Georg Fantner

Beilstein J. Nanotechnol. 2012, 3, 597–619, doi:10.3762/bjnano.3.70